CNR-Istituto Officina Dei Materiali (Trieste) | NFFA.eu

CNR-IOM (TS)
CNR-Istituto Officina Dei Materiali (Trieste)

Address

Edificio Q2, Area Science Park, Strada Statale 14km- Basovizza-Trieste- Italy

https://www.iom.cnr.it/

The Site Offer

Tools available @ laboratories

Theory & Simulation

Theory & Simulation

AMM Atoms and molecules in motion

ESP Excited-state properties

MP Magnetic properties

SGSEP Structural and ground-state electronic properties

TP Transport properties

Structural & Morphology Characterization

Electron and ion beam technologies

SEM Scanning Electron Microscopy

TEM Transmission Electron Microscopy

Scanning probe microscopy

AFM Atomic Force Microscopy

STM Scanning Tunneling Microscopy

X-ray analysis

XRD X-Ray Diffraction

Electronic & Chemical & Magnetic Characterization

Electron spectroscopy

ARPES Angle Resolved Photoelectron Spectroscopy

RESPED/RESPES Resonant Photoemission Spectroscopy/Diffraction

UPS Ultra Violet Spectroscopy

XPS X-ray Photoelectron Spectroscopy

Magnetic characterisation

MOKE Magneto-Optic Kerr Effect

MT Magneto-transport

Optical spectroscopy

Pump-probe Pump-probe

X-ray/soft-X-ray spectroscopy

IOS In-operando spectroscopy

XAS X-ray Absorption Spectroscopy

XMCD/XMLD X-ray Magnetic Circular/Linear Dichroism

Growth & Synthesis

Chemical depositions of thin films

CVD Chemical Vapour Deposition

Physical depositions of thin films

MBE Molecular Beam Epitaxy

PLD Pulsed Laser Deposition

Thermal treatments

SSR Solid State Reaction

TP Thermal processes

Nano to Micro/Macro

Biomolecules and biomaterials analysis

OM Optical Manipulation

in vitro assays and cell analysis

CCF Cell culture facilities

DH Digital holography

Micro-fabrication

ECD Electrochemical deposition

Standard depos. Standard chemical and physical deposition cleanroom/lab processes

Standard etching Standard dry/wet patterning cleanroom/lab processes

UVL Ultra Violet Lithography

UV-SL UV-Soft lithography

Lithography & Patterning

Electron and ion beam lithography

EBL Electron Beam Lithography

FIB Focused Ion Beam

Patterning, replication, and sample navigation

ICP Inductively Coupled Plasma

NIL NanoImprint Lithography

RIE Reactive Ion Etching

Photon-based lithography

UV-IL Ultra Violet - Interference lithography

This research project has received funding from the EU's H2020 framework programme for research and innovation under grant agreements NFFA-Europe (n. 654360 from 1/9/2015 to 28/02/2021) and NFFA-Europe-Pilot (n. 101007417 from 1/03/2021 to 28/02/2026)

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