ELISA 2026, Electrons in Lithography and Imaging for Science and Applications
ELISA 2026 is the successor of the joint conference on Low Energy Electron Applications in Patterning (LE2AP) + Low Energy Electron Lithography, Imaging and Soft Matter (LEELIS) now also with the BEACON community, Beam Induced Nano-Manufacturing, formerly Focused Electron Beam Induced Processing on board.