spectroscopic photoemission and low energy electron microscope

Electronic & Chemical & Magnetic Characterization (Spectro-microscopy)

SPELEEM microscope is being used by a broad range of researchers from different scientific areas such as materials science, nano-science and technology, physics, chemistry, and biophysics. Here are the main imaging modes of the SPELEEM microscope:

- X-ray Photoemission Electron Microscopy (XPEEM). Energy filtered imaging (elemental/chemical mapping).
- X-ray Magnetic Circular (Linear) Dichroism (XMCD, XMLD). Imaging of magnetic domains in ferromagnets (XMCD) and in antiferromagnets (XMLD) on the nm scale.
- Micro-X-ray Photoemission Spectroscopy (micro-XPS). Photoelectron spectroscopy
from extremely small areas down to a fraction of a micron.

- Micro-X-ray Absorption Spectroscopy (XAS). Imaging of secondary electron emission at fixed kinetic energy as a function of the photon energy.

- PhotoElectronDiffraction( PED). The intensity of a core level line as a function of energy
and emission angle is measured. The technique can provide spatially resolved
information on the surface crystallographic structure and is therefore complementary to
LEED and STM. If the valence band electrons form a diffraction pattern, the band- and
Fermi surface mapping in the full cone becomes possible (micro-ARPES).
- Low Energy Electron Microscopy (LEEM). Study of morphology of crystalline surfaces. Several contrast mechanisms (including Dark Field Imaging) allow the determination of the lateral dimensions of regions with a given crystal structure, the thickness distribution of thin overlayers with monolayer resolution, the imaging of monoatomic surface steps and other morphological features)
- Micro-Low Energy Electron Diffraction (micro-LEED). The diffraction patterns can be collected from areas as small as 100nm.

          provided at Large Scale Facilities by:
SPELEEM - spectroscopic photoemission and low energy electron microscope
Surface imaging techniques for extracting simultaneously elemental, chemical, magnetic and electronic information at high (<20nm) spatial resolution.
Synchrotron radiation
Energy range 30-1200eV. Electron gun, LB6 cathode, energies 0-1000eV. Hg UV lamp, energy 4.6eV
Photoelectron emission, detector - CMOS camera. For detection modes, follow the webpage https://www.maxiv.lu.se/accelerators-beamlines/beamlines/maxpeem/techniques/
from 50meV up to 250meV depending on the mode of operation
5 - 20nm depending on the operation mode
conductive samples, size from 5x5 up to 10x10mm^2.
Base pressure - low -10mbar range. Cooling down to 90K, heating up to 1500C. Magnetic field up to 500G. Current up to 2A can be applied.
LEED, Auger, microbalance, sputter gun.
Film deposition
STM with STM transfer kit allowing to transfer the sample from the STM chamber to the microscope.
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