The Lund Nano Lab (LNL), inagurated in 2007, is a world-class laboratory with a ISO 7 epitaxy and a ISO 5 process cleanrooms. We provide support to the researchers in important areas, such as material science (growth and processing), electronic and photonic device processing (electron beam and nanoimprint lithography, etching and deposition), characterisation of nanostructures (SEM, AFM, electical measurements). The LNL personel have extensive experience in both epitaxial growth of III-V semiconductor nanowires and generation and study of nano-size aerosol particles, where LNL have world leading positions.
At MAX IV, opened in 2016, access will be given to an SPELEEM instrument at the MAXPEEM beamline, providing high-resolution surface imaging with structural, chemical, electronic, and magnetic contrast. At the moment, totally 8 beamlines are in operation and few more are under commisioning phase. The MAX IV staff has more than 35 years of research experience in synchrotron light physics.
Characterisation by electron microscopy in Lund is offered through nCHREM, the national center for high resolution electron microscopy. The nCHREM center closely collaborates with LNL within the material science area. The main instrument for visitors JEOL 3000F FEGTEM with a high spatial resolution. STEM with X-ray energy dispersive spectroscopy (EDS) can be applied for elemental analysis.