LUNDS UNIVERSITET + MAX IV | NFFA.eu

LUND + MAX IV
LUNDS UNIVERSITET + MAX IV

Address

Fotongatan 2- Lund- Sweden

https://www.lunduniversity.lu.se/

The Site Offer

Tools available @ laboratories

Lithography & Patterning

Electron and ion beam lithography

EBL Electron Beam Lithography

FIB Focused Ion Beam

Patterning, replication, and sample navigation

ICP Inductively Coupled Plasma

NIL NanoImprint Lithography

RIE Reactive Ion Etching

Photon-based lithography

DTL Displacement Talbot Lithography (DTL)

SM-DWL Submicron Direct Write Lithography (Binary/Grayscale)

Electronic & Chemical & Magnetic Characterization

Optical spectroscopy

Ellipsometry Ellipsometry

Spectro-microscopy

SPELEEM spectroscopic photoemission and low energy electron microscope

Structural & Morphology Characterization

Electron and ion beam technologies

SEM Scanning Electron Microscopy

TEM Transmission Electron Microscopy

Scanning probe microscopy

AFM Atomic Force Microscopy

X-ray analysis

XRD X-Ray Diffraction

Growth & Synthesis

Chemical depositions of thin films

ALD Atomic Layer Deposition

CVD Chemical Vapour Deposition

Physical depositions of thin films

EBE e-beam evaporation

MS Magnetron sputtering

TE Thermal evaporation

Synthesis of nanoparticles

AD Aerosol deposition

Thermal treatments

FLA Flash lamp annealing

Nano to Micro/Macro

Micro-fabrication

Standard depos. Standard chemical and physical deposition cleanroom/lab processes

Standard etching Standard dry/wet patterning cleanroom/lab processes

UVL Ultra Violet Lithography

This research project has received funding from the EU's H2020 framework programme for research and innovation under grant agreements NFFA-Europe (n. 654360 from 1/9/2015 to 28/02/2021) and NFFA-Europe-Pilot (n. 101007417 from 1/03/2021 to 28/02/2026)

This work is licensed under a Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International License