NIL is a novel technique for the fabrication of nanostructures on large surfaces. The method is based on the excellent replication fidelity obtained with polymers. Once a solid stamp with a nanorelief on the surface is fabricated it can be used for the replication of many identical surface patterns. It therefore circumvents many limitations of conventional photolithography. Both thermal NIL into various thermoplastic materials and UV-assisted NIL, e.g. for the fabrication of stamp copies are available with sub-10 nm resolution. Imprint-based solutions can be used for a wide variety of applications and areas such as optics (refractive and diffractive elements, photonics, plasmonics, liquid crystals), biology (templates for cell growth, protein patterning, and crystallization), micro- and nanofluidics (for analysis of transport through lipid bilayers), surface wetting (via modification of hydrophilic and hydrophobic properties) etc.
Automatic lab presse Webber PW equipped with an external electro-hydraulic supply station
Automatic lab UV press equipped together with an integrated pneumatic supply station
Max Press force: 35 kN
Temperature range: 18-300°C
Primary exposure wavelength: 254 nm
Samples: 6” plates
Vacuum imprint tool with integrated heater
The system is equipped with an external electro-hydraulic supply station. Press and supply station are connected with hydraulic tubes and quick lock components. Water cooling system.
Two-hand safety control panel, security protection device, rise of pressure adjustable, additional manometer, hand pump, pressure release valve, digital display PRESSTRONIC for force- and pressure-sensors for exact reading of the press force easier. Peak storage and a serial PC-interface
CSIC-CNM
Spain
NIL 4 inch system - Obducat (N4)
Thermal imprint with high resolution
Imprint by air to achieve high resolution and uniformity
Samples from 2mm x 2mm up to 4 inch
1-80bar pressure and up to 350ºC
Spinners and hot-plates for resist preparation
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Resolution up to 20 nm with pattern transfer
Temperature and Pressure control and monitoring
no
na
0
PSI
Switzerland
Jenoptic HEX 03 hot press @ Laboratory for Micro and Nanotechnology
Thermal imprint and UV-assisted replication processes
Jenoptic HEX 03 hot press
Pressing force 200kN
Embossing temperature up to 320°C
4" wafers and chips, normally 1x1 or 2x2 mm2
Embossing under vacuum
Spin-coater, wet-bench, hot-plates, microscope
Molding of thermoplastic polymers with resolution <10 nm
Flux measurement before exposures
Optical alignment with 3 μm overlay accuracy for double sided aligned embossing
In SEM a beam is scanned over a sample surface while a signal from secondary or back-scattered electrons is recorded. SEM is used to image an area of the sample with nanometric resolution, and also to measure its composition, crystallographic phase distribution and local texture.
AFM is a surface sensitive technique permitting to obtain a microscopic image of the topography of a material surface and certain properties (like friction force, magnetization properties…). Typical lateral image sizes are within a range of only a few Nanometers to several Micrometers, and height changes of less than a Nanometer.
Electron-beam lithography is a direct write nanopatterning technique utilizing a finely focused electron beam in order to write nanoscale patterns on special e-beam resists in two and three dimensions. Compared to other nanostructuring methods, it stands out for its high level of flexibility and resolution and reasonable patterning speed.
In TEM/Scanning TEM (STEM) high energy electrons incident on ultra-thin samples, allow imaging, diffraction, electron energy loss spectroscopy and chemical analysis of solid materials with a spatial resolution on the order of 1-2 Å. Samples must have a thickness of a few tens of nanometres and are prepared in sample preparation laboratory.
The Cell Culture Facility provides the necessary equipment (basic cell culture, sample preparation, functional assays and imaging equipment) for the study of the effect of biomaterials on specific cell behavior and function and cellular responses, such as cell survival, adhesion, morphology, proliferation, growth, migration and differentiation.
