PAUL SCHERRER INSTITUT | NFFA.eu

PSI
PAUL SCHERRER INSTITUT

Address

Forschungsstrasse 111- Villigen- Switzerland

https://www.psi.ch/en

The Site Offer

Tools available @ laboratories

Nano to Micro/Macro

Micro-fabrication

DWL Direct write lithography

ECD Electrochemical deposition

Standard depos. Standard chemical and physical deposition cleanroom/lab processes

Standard etching Standard dry/wet patterning cleanroom/lab processes

UVL Ultra Violet Lithography

Structural & Morphology Characterization

Electron and ion beam technologies

SEM Scanning Electron Microscopy

Light and acoustic microscopy

OTFM Optical Thin Film Metrology

Scanning probe microscopy

AFM Atomic Force Microscopy

STM Scanning Tunneling Microscopy

Lithography & Patterning

Electron and ion beam lithography

EBL Electron Beam Lithography

Patterning, replication, and sample navigation

ICP Inductively Coupled Plasma

NIL NanoImprint Lithography

RIE Reactive Ion Etching

Photon-based lithography

DTL Displacement Talbot Lithography (DTL)

SM-DWL Submicron Direct Write Lithography (Binary/Grayscale)

TWL Two-photon Lithography

Synchrotron-based lithography

EUV-IL Extreme Ultra Violet - Interference lithography (temporarily unavailable)

Growth & Synthesis

Chemical depositions of thin films

ALD Atomic Layer Deposition

Physical depositions of thin films

EBE e-beam evaporation

TE Thermal evaporation

Electronic & Chemical & Magnetic Characterization

Electron spectroscopy

ARPES Angle Resolved Photoelectron Spectroscopy

XPS X-ray Photoelectron Spectroscopy

Optical spectroscopy

OS Optical spectroscopy

This research project has received funding from the EU's H2020 framework programme for research and innovation under grant agreements NFFA-Europe (n. 654360 from 1/9/2015 to 28/02/2021) and NFFA-Europe-Pilot (n. 101007417 from 1/03/2021 to 28/02/2026)

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