Thermal treatments

FLA Flash lamp annealing
The furnace uses flash lamps for rapid processing of materials at high temperature (implant annealing, oxidation , nitridation, ohmic contact…), particularly for semiconductor wafers.
SP Sintering processes
SSR Solid State Reaction
The solid-state reaction route is the most widely used method for the preparation of polycrystalline solids from a mixture of solid starting materials.
TP Thermal processes
Processes involving exposure of (usually) semiconductors samples to oxidizing or inert ambient at high temperature (300- 1150C). For example, O2 or H2O ambient are used to grow silicon dioxide on Si. Inert ambient (N2, Ar) are used to densify layers or to activate and redistribute dopant impurities. N2/H2 is used for aluminum sintering.