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ACS Nano 2025 19 (26), 23552-23563

Coherent X-ray Diffraction Imaging of a Twinned PtRh Catalyst Nanoparticle under Operando Conditions

L. J. Bachmann, D. Lapkin, J. Schober and et al.

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L. J. Bachmann, D. Lapkin, J. Schober, et al.

We performed operando Bragg coherent X-ray diffraction imaging under CO oxidation, as well as oxidizing conditions on a precharacterized single PtRh nanoparticle. We found that this (111) oriented particle with truncated octahedral shape is twinned with a Σ3 twin boundary parallel to the SrTiO3 (001) support, at the height of the nanoparticle edges. We observed that the average strain at the twin boundary is higher under CO oxidation conditions compared to pure CO or O2. In addition, we observed that two new facets were forming during the oxidizing/reducing cycles. Furthermore, we observed mixed edge/screw dislocations at the twin boundary, but only where the {111} side facets meet. Inducing such dislocations changes the local strain and the atomic structure of the nanoparticles, which may create more active sites close to the nanoparticle edges.

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ACS Nano 2025 19 (25), 23258-23275

Double-Pulse Femtosecond Laser Fabrication of Highly Ordered Periodic Structures on Au Thin Films Enabling Low-Cost Plasmonic Applications

F. Fraggelakis, P. Lingos, G. D. Tsibidis and et al.

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F. Fraggelakis, P. Lingos, G. D. Tsibidis, et al.

Periodic plasmonic arrays, making possible excitations of surface lattice resonances (SLRs) or quasi-resonant features, are of great importance for biosensing and other applications. Fabrication of such arrays over a large area is typically very costly and time-consuming when performed using conventional electron beam lithography and other methods, which reduce application prospects. Here, we propose a technique of double femtosecond pulse (∼170 fs) laser-assisted structuring of thin (∼32 nm) Au films deposited on a glass substrate and report a single-step fabrication of homogeneous and highly ordered Au-based laser-induced periodic surface structures (LIPSS) over a large area. Our experimental results unveil the key importance of the interpulse delay as the determining factor rendering possible the homogeneity of laser-induced structures and confirm that highly ordered, functional LIPSS occurs solely upon double pulse irradiation under a specific interpulse delay range. A theoretical investigation complements experimental results, providing significant insights into the structure formation mechanism. Ellipsometric measurements show that such LIPSS structures can exhibit highly valuable plasmonic features in light reflection. In particular, we observed ultranarrow resonances associated with diffraction-coupled SLRs, which are of paramount importance for biosensing and other applications. The presented data suggest that femtosecond double pulse structuring of thin metal films can serve as a valuable and low-cost tool for large-scale fabrication of highly ordered functional elements and structures.

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Materials Today, 87, 20-28

Ultralow line edge roughness of hybrid multilayer extreme ultraviolet resist with vertical molecular wire structure

J. Lee, H. Ji, C. Koh and et al.

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J. Lee, H. Ji, C. Koh, et al.

This study introduces an innovative extreme ultraviolet (EUV) resist featuring a vertically oriented molecular wire architecture, designed to achieve exceptionally low line edge roughness (LER). The resist is synthesized via molecular layer deposition, a gas-phase technique that allows precise monolayer-level control over thickness, ensuring excellent reproducibility, conformality, and uniformity. The hybrid multilayer resist is constructed through controlled ligand-exchange reactions between diethylzinc and 3-mercaptopropanol (3MP), which create vertically oriented molecular wires with widths below 1 nm. This innovative structure achieves an unprecedentedly low LER of 1.37 nm at a dose of 60 mJ/cm2. EUV exposure induces unique cross-linking coordination bonds between the zinc atoms and the oxygen and sulfur atoms in 3MP without degassing, thereby enhancing EUV sensitivity. The combination of vertically oriented high-aspect-ratio molecular wires and effective lateral cross-linking significantly improves EUV sensitivity and robustness during etching. This pioneering hybrid multilayer EUV resist may satisfy the stringent requirements of advanced semiconductor manufacturing.

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Deliverables view all

WP14 - JA4 - A safe-by-design platform for nanomaterials

D14.4 - Integration and characterization of the space correlation functionality on the complete setup

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31 May 2025

T. F. Keller (DESY), S. Kulkarni (DESY), H.A Suarez Orduz (ESRF), H. Castillo-Michel (ESRF)

This report presents an experimental workflow designed to perform correlative measurements as part of the NEP-NFFA project, using silicon nitride (Si3N4) membranes equipped with platinum (Pt) markers. These membranes were developed through a collaboration between DESY NanoLab and ESRF-ID21. DESY NanoLab was responsible for the Pt deposition on the Si3N4 membranes, while ESRF-ID21 carried out the correlative measurements. The purpose of the Pt markers on the membranes is to act as fiducial points that help to precisely locate specific regions or points of interest (ROI/POI) with micrometric or nanometric accuracy. This is essential to analyze the same point of the sample using different techniques, and to collect complementary data for a better understanding of the sample. The proposed workflow involves complementary techniques such as optical microscopy, scanning electron microscopy (SEM), and synchrotron-based techniques like micro X-ray fluorescence (µXRF) performed at the nano-X-ray microscope (nano-SXM) at beamline ID21 of the Softhis report describes the initial design of the membranes with the markers, as well as the optimized version, based on results obtained during the first tests with nano-SXM. In addition, it shows how the Pt markers enable accurate correlation through the web-based graphical interface Daiquiri, linking the morphological information from optical microscopy with the chemical information obtained from µXRF. The technical feasibility of this approach has been confirmed, showing that the process is reproducible and potentially applicable to similar studies. This is possible due to the standardized Pt deposition process and the use of nano-SXM for sample localization and data acquisition.

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WP14 - JA4 - A safe-by-design platform for nanomaterials

D14.5 - Production and report of three case studies with selected workflows

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31 May 2025

J. Linell (LUND), C. Isaxson (LUND), C. Abrahamsson (LUND), Maria Enea (INL) et al.

This report aims to demonstrate the usefulness of the NFFA workflow to assess nanomaterials and their interaction with different cell lines. It also seeks to generate improved protocols and educational material that can be shared with other European users working with similar ENMs.

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WP16 - JA6 - Implementing FAIR data approach within NEP

D16.6 - Final report on data provenance tools for NEP community

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28 Feb 2025

N. Marzari (EPFL and PSI), R. Aversa (KIT), A. Recchia (eXact lab), G. P. Brandino (eXact lab), V. Granata (EPFL), E. Bainglass (PSI)

This deliverable summarizes the experience and guidelines for the NFFA community in developing, deploying, and using data provenance tools. It is articulated in 3 sections, dedicated to 1) establishing the high-level provenance of the physical and digital entities of research workflows, 2) automatically integrating this into digital provenance tools, including electronic lab notebooks and workflow management systems, and 3) disseminating this in FAIR modes to the community at large.

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Transnational Access Statistics

30 calls for access

1072 proposals submitted

62% rate of acceptance

29% with Large Scale Facilities

12% with theory

11% with industry

~3 average users per proposal

65 countries applying

3298 lab sessions