Chemical depositions of thin films

GBM Graphene-based materials
Synthesis of graphene layers and other 2D materials. Especially using Chemical Vapor Deposition techniques on catalytic metal substrates to obtain large area uniform films. Some techniques are also available for the transfer and functionalization of those graphene based or 2D materials to tune their chemico-physical surface properties.
ALD Atomic Layer Deposition
ALD is an advanced thin film manufacturing process for mainstream applications expanding beyond semiconductor processing. It achieves new levels of performance in Li-ion batteries, fuel cells, logic and memory devices, light-harvesting energy (i.e. surface passivation layers, buffer layers in solar cells) but also encapsulation of polymers.
CSD Chemical solution deposition
CSD is a growth technique of thin films, self-assembled nanomaterials or nanocomposite thin films where chemical solution is first deposited on substrates and then chemical precursors are transformed into solid compounds. A wide range of functional oxides and inorganic compounds are grown by CSD leading to epitaxial or polycrystalline structures.
CVD Chemical Vapour Deposition
It is a chemical process used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit.