Scanning probe lithography

DPN Dip-pen Nanolithography (DPN)
Scanning probe lithography (SPL) methods have unique strengths in terms of resolution, throughput and patterning speed. Generally, SPL methods utilize the excellent control over positioning and movement of a tip or sample stage for highly localized additive and maskless deposition of chemical compounds or carrier fluids with functional components.
AFML Atomic Force Microscopy Lithography
In AFM, short range tip-sample interactions provide insight into phenomena taking place at the surface: catalysis, friction, low dimensional magnetism... The knowledge can be used to modify the surface to create nanometer scale patterns providing a true 3D reconstruction of patterns during the fabrication process.
T-SPL Thermal Scanning Probe Lithography
T-SPL is a mask-less, serial and direct-write lithography technique, where a cantilever with a heatable ultra-sharp silicon tip (few nanometers in diameter) is brought into contact with a special resist that is spin-coated on a substrate. It can be used to create sub-10 nm structures as well as complex, high resolution 3D shapes.