Scanning probe lithography (SPL) methods have unique strengths in terms of resolution, throughput and patterning speed. Generally, SPL methods utilize the excellent control over positioning and movement of a tip or sample stage for highly localized additive and maskless deposition of chemical compounds or carrier fluids with functional components.

In AFM, short range tip-sample interactions provide insight into phenomena taking place at the surface: catalysis, friction, low dimensional magnetism... The knowledge can be used to modify the surface to create nanometer scale patterns providing a true 3D reconstruction of patterns during the fabrication process.

T-SPL is a mask-less, serial and direct-write lithography technique, where a cantilever with a heatable ultra-sharp silicon tip (few nanometers in diameter) is brought into contact with a special resist that is spin-coated on a substrate. It can be used to create sub-10 nm structures as well as complex, high resolution 3D shapes.