(UHV-RAIRS) ultrahigh vacuum reflection-absorption infrared spectroscopy permits vibrational spectroscopic studies at grazing incidence on adsorbed molecules on well-defined solid surfaces.
In UHV-RAIRS, the optical path is entirely evacuated to avoid background signals from gas phase species and results in a superior sensitivity and stability of the system. Essential prerequisites for monitoring molecular species adsorbed, e.g., on oxide single-crystal surfaces are wide pressure (UHV to ambient conditions) and temperature ranges (1000-100 K).
Ultra-high vacuum-reflection absorption IR spectroscopy (UHV-RAIRS) @ DESY NanoLab
Vibrational spectroscopic study at grazing incidence on well-defined solid surfaces. The unique feature of the IR apparatus is the entirely evacuated optical path to avoid background signals from gas phase species
Bruker, VERTEX 80v
~ 900 cm-1 - 5 cm-1
External MCT detector for RAIRS measurements on well-ordered solid surfaces
Internal DTG detector for Fourier-transform IR spectroscopy (FTIRS) on powder surfaces
Spectral resolution: 0.2 cm-1
In-situ measurements at variable pressure range: 10-10 mbar < P < 1 bar
In-situ measurements at variable temperature range: 110 K to 1000 K (liquid N2 cooling)
10-10- 10-11 mbar base pressure
Gas dosing system permitting in-situ experiments
Direct sample transfer under UHV from and to the UHV system
CSIC-ICMM
Spain
Stardust: INFRA-ICE module: RAIRS
Reflection Absorption Infra-Red Spectroscopy (mid- and near IR) under ultra-high vacuum conditions and at low temperatures (T=15-300K). Complete evacuated optical path to avoid background signals from gas phase species.
Bruker, VERTEX 70V spectrometer.
Mid-IR: standard globar and a water-cooled high-power source. Near-IR: tungsten halogen lamp.
12800 cm^-1 - 850 cm^-1
For mid-IR: DLaTGS and MCT detectors. For near-IR: InGaAs detector.
Maximum resolution: 0.16 cm^−1
Maximum dimensions: 15 x 15 mm^2. For low temperature experiments: 10 x 10 x 1 mm^2. Substrate needs to be IR reflective (e.g., Au, Al, Cu...).
Base pressure: 4 x 10^-10 mbar. Temperature control: 15 - 300 K. Gases up to 10^-6 mbar can be introduced in the sample chamber.
UV irradiation (Ly-alpha line: 121.6 nm). Electron irradiation (1-500 meV). Ion irradiation (0.2 - 6 keV).
Quadrupole mass spectrometry (1 - 200 amu) for Thermal Programmed Desorption experiments (T = 15 - 300 K).
XPS is a surface spectroscopic technique for quantitative measurements of the elemental composition or stoichiometry and the chemical state of the present elements, like their oxidation state and chemical bonds. XPS is highly surface sensitive, giving chemical and binding energy information from the a narrow region close to the surface.
We offer a multiple ion-cluster source operating in ultra-high vacuum devoted to the fabrication and characterization of highly controlled nanoparticles. They are produced in gas phase with high purity and controlled size, structure and stoichiometry and they can be collected in the desired coverage on arbitrary surfaces for different uses.