ESFOSCAN equipment is based on the PHI VersaProbe 4, a highly versatile, multi-technique instrument to perform X-ray Photoelectron Spectroscopy (XPS) with monochromatic, micro-focused, scanning X-ray source. The X-ray induced secondary electron imaging (SXI) provides a perfect correlation between imaged areas and spectroscopy. Capabilities (available options) of the equipment are:

1) Surface spectroscopy measurements in an area size of a few microns.

2) Multiple ion gun options: monoatomic Ar, C60 and argon cluster GCIB (for a variety of organic, inorganic, and mixed materials).

3) Full 5-axis stage functionality including rotation/tilt and heating/cooling during sputtering.

4) Multi-point profiling within a single sputtering crater for analysis of defects inside and outside homogeneities down to a few microns in size.

5) Adjustable solid collection angle for improved angular resolution for Angle-Resolved analysis with advanced software for high-throughput film structure analysis.

6) Characterization of the electronic band structure (main parameters of valence and conduction bands) of organic and inorganic materials using Ultraviolet Photoelectron Spectroscopy (UPS) and Low Energy Inverse Photoemission Spectroscopy (LEIPS) measurements at the same sample location.