Development of X-ray optics for single-digit EUV interference lithography using advanced e-beam lithography and nanofabrication techniques
EUVL experiments at the XIL-II beamline of the SLS
Further development of the EUV interference lithography method
User support under the NFFAproject
Close cooperation with internal and external partners
Performing research of highest quality and publication in high profile journals
You have a PhD degree in science or engineering. You have a keen interest in applied research in nanoscience and technology. After hands-on experience in nanolithography and nanofabrication, you look for new challenges and eager to learn new methods. You are a highly motivated team player with high communicational and organizational skills. Experience in some of the following fields will be of advantage: electron beam lithography, photolithography, EUV lithography, photoresists, optics, nanofabrication techniques, nanocharacterization including AFM and SEM, synchrotron-based methods.
This research project has received funding from the EU's H2020
framework programme for research and innovation under grant agreements NFFA-Europe (n.
654360 from 1/9/2015 to 28/02/2021) and NFFA-Europe-Pilot (n. 101007417 from 1/03/2021 to 28/02/2026)