30 May 2022 - Virtual
Symposium: New trends in advanced lithography and pattern transfer methods
The main scope of the Symposium is to present and discuss the latest advances in ultra-high resolution lithography and methods of pattern transfer, that include advanced electron and ion beam patterning, methods of self-assembly, dry etching, deposition and other techniques.
The deadline for the abstract submissions is extended until January 31, 2022.
Updated information about the event can be found here:
Submit your abstracts here: