Goals of the conference:

• Advancing the understanding of low-energy electron related phenomena by gathering experts of all relevant disciplines.
• Recognizing future applications both at the lab scale and industrial level.
• Addressing the fundamental needs for implementation in patterning via synergy between academia and semiconductor industry.
• Creating new opportunities and attract early-stage researchers to pursue their career in the field.
• Stimulating collaboration among researchers and engineers to enable future patterning applications.

Topics of the conference:

• Photon / electron sensitive materials (resists, underlayers, thin film)
• Focused e-beam induced processing (FEBIP)
• Electron beam lithography (EBL)
• Extreme ultraviolet lithography (EUVL)
• Ion/atom beam lithography
• X-ray lithography
• Low-energy electron microscopy (LEEM)
• Low-voltage (scanning) electron microscopy (SEM)

Call for Abstracts
The abstract submission deadline is extended to Monday June 3, 2024. Please carefully read the submission guidelines and submit your abstract here.

Registration
The registration is now open. Early bird is until Wednesday 31 July 2024
The price indicated on the website includes full conferences access, coffee breaks, lunches, welcome package, and social event access.