Centre national de la recherche scientifique

LPN offers a complete clean room environment of 700m2. The usual standard processes : chemical cleaning, reactive ion etching, metal and dielectric deposition, ALD, UV photolithography are available together with AFM and SEM inspection tools. Our premises include high resolution e-beam lithography and He ion lithography/microscopy.

We offer also III-V MBE on two inches i.e  high mobility two dimensional electron gas in GaAlAs/GaAs  or quaternary III-V for laser.

High resolution electron microscopy is available with a 200kV corrected TEM.